Ultra-High Resolution &
Ultra-High Sensitivity Scatterometer
with Thin Film Measurement Capabilities
The n&k OptiPrime-X series are automated metrology systems used to fully characterize and monitor Thin Film and OCD applications for both current and next generation IC processes.
Utilizing patented all-reflective optics, a broadband wavelength range (190 – 1000nm), proprietary optical formulation, and an industry leading signal-to-noise ratio, each system provides the accurate and reproducible data required to monitor subtle changes in critical device parameters (thin film thickness, optical properties, critical dimensions (CD), poly recess profile, sidewall angle) across various key applications. The OptiPrime-X also incorporates a Single Wavelength ellipsometer to measure ellipsometric parameters at 633nm for added Thin Film Metrology capability.
The n&k OptiPrime-X applications cover both current and next generation thin film measurement demands for R&D and Production: Ultra Thin Films and Residual Layers, Multi-Layer Stacks, Inhomogeneous Films, 193 nm and 248 nm ARCs and Resists, Low-κ Films, High-κ Films, and films deposited on practically any substrate. In addition, through the use of the SWE, the n&k OptiPrime-X offers excellent dynamic R&R results when measuring ultra-thin films.
Thicknesses and n and k spectra of 193 nm BARC and Resist are simultaneously determined:
193 nm Resist = 2968 Å
193 nm BARC = 819 Å
The n&k OptiPrime-CD’s OCD scatterometry applications cover structures with very large pitches and very small pitches, 2-D and 3-D complex structures including films inside and outside of shallow and deep trenches and contact holes. Because of our patented and unique optical design, n&k Technology offers the highest signal-to-noise ratio and lowest cost of ownership to support your OCD requirement.
SOI Trench (Flared CD Bottom)
Poly Recess Trench