Photomask

Optical metrology for Conventional, Phase Shift, EUV, and Mask Blanks photomasks remains key for Photomask shops worldwide. Our unique combination offering to measure both Reflectance and Transmittance has proven to be very beneficial to Photomask makers throughout the years.

Key Applications

• Conventional Mask Applications – Thin Film and Trench/OCD

• • AEI, ADI, ACI, ASI Photomasks
  • Thickness of MoSi, Cr, CrOxNy, Photoresist
  • Etch Trench Depth
  • Global CD Uniformity (AEI and ASI Photomasks)
  • CD Linearity (ACI Photomasks)
  • Measurements of 2-D Structures

• EUV Applications – Thin Film and Trench/OCD

• • Optical property characterization of Cap (Ru) and Multilayer (Mo and Si) films
  • Monitor thickness of Ru Cap on Multilayer
  • Optical property characterization of Absorber materials (TaN and TaO_x)
  • Monitor thickness of TaO_x
  • Discovery of Sidewall Oxide along Absorber Etch
  • Monitoring of Depth and CD

• Optical Density Application
• Mask Blanks Production Control