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Latest Generation Metrology for Combined Thin Films and OCD Measurements: The n&k EclipSE is our latest generation metrology system that combines spectroscopic reflectometry with single-wavelength ellipsometry. The EclipSE is a fully automated high-throughput system for applications involving ultra-thin films less than a few nm, as well as multi-layer film stacks and very thick films. The EclipSE also provides OCD measurements of complex trench and hole structures, with the accuracy, repeatability, and reproducibility that meets the Ultra-tight specs of advanced FABs.

Posted on January 15, 2018 by Thomas Luong in News
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TSV Development Project: n&k has developed new image based hardware that can be utilized for Depth and CD measurements at any stage of integration of the TSV, whether via first, via middle, or via last. If there is interest in working with n&k to characterize your TSVs please contact us.

Posted on April 10, 2015 by Thomas Luong in News
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n&k’s company profile appearing in the December 2014 issue of Solid State Technology succinctly provides the company’s background, as well as features and capabilities of our key products.

Posted on December 4, 2014 by Thomas Luong in News
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n&k Technology is proud to announce that an entire section in Wikipedia now appears regarding the Forouhi-Bloomer Equations. The title of the piece is “Refractive index and extinction coefficient of thin film materials”. You can find the article in Wikipedia.org under its title or under “Forouhi-Bloomer Equations”. The Forouhi-Bloomer Equations represent a physically valid universal set of equations for n and k as functions of wavelengths that include Extreme Ultra-Violet (EUV) to Infra-Red (IR) wavelengths.

Posted on October 8, 2014 by Thomas Luong in News
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n&k has extended the capabilities of its thin film OCD metrology tools by adding the ability to measure the stress of films deposited films deposited on silicon wafers.  This new feature will be available on all new Olympian, OptiPrime, and LittleFoot systems starting in July 2014.

Posted on June 9, 2014 by Thomas Luong in News
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n&k ships fully automated 5000-CD system to Europe

Posted on September 19, 2013 by Thomas Luong in News No Comments
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Optiprime scatterometer ships to a leading power device manufacturer in Germany. The n&k OptiPrime is one of n&k’s bestselling tools for power devices, offering the capability to measure complex film stacks, 2D (trenches) and 3D (contact holes).">The n&k Optiprime scatterometer ships to a leading power device manufacturer in Germany. The n&k OptiPrime is one of n&k’s bestselling tools for power devices, offering the capability to measure complex film stacks, 2D (trenches) and 3D (contact holes).

Posted on August 1, 2013 by Thomas Luong in News No Comments
Optiprime scatterometer ships to a leading power device manufacturer in Germany. The n&k OptiPrime is one of n&k’s bestselling tools for power devices, offering the capability to measure complex film stacks, 2D (trenches) and 3D (contact holes)." class="tb-button tb-button-small default read-more" target="_self">View Post

Effects of Measured Spectral Range on Accuracy and Repeatability of OCD Analysis, published in Solid State Technology, co-authored by Infineon and n&k.

Posted on July 1, 2013 by Thomas Luong in News No Comments
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Gemini passes intense acceptance testing by a major US semiconductor manufacturer for measurements of EUV photomasks. The n&k Gemini is an ultra-high resolution scatterometer specifically designed for accurate and repeatable OCD measurements of depths, CDs and profiles of complex 2-D and 3-D structures, as well as thicknesses, and n and k spectra of multi-layer films pertaining to photomasks.">The n&k Gemini passes intense acceptance testing by a major US semiconductor manufacturer for measurements of EUV photomasks. The n&k Gemini is an ultra-high resolution scatterometer specifically designed for accurate and repeatable OCD measurements of depths, CDs and profiles of complex 2-D and 3-D structures, as well as thicknesses, and n and k spectra of multi-layer films pertaining to photomasks.

Posted on April 1, 2013 by Thomas Luong in News No Comments
Gemini passes intense acceptance testing by a major US semiconductor manufacturer for measurements of EUV photomasks. The n&k Gemini is an ultra-high resolution scatterometer specifically designed for accurate and repeatable OCD measurements of depths, CDs and profiles of complex 2-D and 3-D structures, as well as thicknesses, and n and k spectra of multi-layer films pertaining to photomasks." class="tb-button tb-button-small default read-more" target="_self">View Post

LittleFoot scatterometers ship to leading power device manufacturers in Japan. The cost effective, fully automated LittleFoot , with a footprint less than 40% (approximately) of conventional scatterometers, has all the capabilities of the n&k OptiPrime, providing measurements of complex film stacks, 2D (trenches) and 3D (contact holes).">Two n&k LittleFoot scatterometers ship to leading power device manufacturers in Japan. The cost effective, fully automated LittleFoot , with a footprint less than 40% (approximately) of conventional scatterometers, has all the capabilities of the n&k OptiPrime, providing measurements of complex film stacks, 2D (trenches) and 3D (contact holes).

Posted on February 1, 2013 by Thomas Luong in News No Comments
LittleFoot scatterometers ship to leading power device manufacturers in Japan. The cost effective, fully automated LittleFoot , with a footprint less than 40% (approximately) of conventional scatterometers, has all the capabilities of the n&k OptiPrime, providing measurements of complex film stacks, 2D (trenches) and 3D (contact holes)." class="tb-button tb-button-small default read-more" target="_self">View Post
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