n&k Technology, Inc., of San Jose, California, manufactures advanced metrology tools for the semiconductor, photomask, data storage, flat panel display and solar cell industries. The company's ultra-high resolution and ultra-high sensitivity optical metrology systems have particularly low cost of ownership and are used for film thickness, n and k, depth, CD and profile measurements of simple and complex 2-D and 3-D nanostructures. The core technology is based on DUV-Vis-NIR (or IR) broadband spectrophotometry utilizing patented reflective optics, in conjunction with the Forouhi-Bloomer dispersion equations and Rigorous Coupled Wave Analysis. n&k Technology systems, ranging from table-top to fully automated, are field-proven, production-worthy, fast, accurate, and non-destructive, and will enable users to characterize and measure virtually any combination of thin films, substrates, and nanostructures.