OptiPrime-CD Series: OptiPrime-CD
General Overview DUV-Vis-NIR (Wavelength Range: 190nm – 1000nm) Scatterometers/Thin Film Metrology Systems: n&k OptiPrime-CD The n&k OptiPrime-CD series are DUV-Vis-NIR scatterometers/thin film metrology systems, based on polarized reflectance measurements (Rs and Rp) from 190nm – 1000nm, with micro-spot technology. The systems in the OptiPrime-CD Series determine thickness, n and k spectra from 190nm – 1000nm of thin films, as well as depths, CDs, and profiles of trenches and contact holes. Due to their ability to measure a large range of OCD and thin film structures that cover current and future applications, the tools belonging to the OptiPrime-CD Series are used extensively for power device and MEMS applications, as well as for the most challenging applications of today’s semiconductor industry. The OptiPrime-CD Series is our “next-generation” DUV-Vis-NIR Scatterometer/Thin Film series. This series was launched in 2012, superseding the previous generation, 5000-CD and 1700-CD Series. Advancements in the optical design of the OptiPrime-CD Series provide a smaller micro-spot over the previous generation.
Thin Film
a-C:H, TiNx, AlOx
%N in TiNx, etc.)
OCD Structures In addition, the tools of the OptiPrime-CD Series measure films associatedwith OCD structures, including hard masks on trenches and contact holes and films at the bottom or lining of these structures. Trench Array Capability Chart for the OptiPrime-CD Series Contact Hole Array Capability Chart for the OptiPrime-CD Series
holes structures
Optiprime-CD Series Due to their ability to measure a large range of OCD and thin film structures that cover current and future applications, the tools belonging to the OptiPrime-CD Series are used extensively for the most challenging applications of today’s semiconductor industry.