Gemini Series:Gemini
General Overview DUV-Vis-NIR (Wavelength Range: 190nm – 1000nm) Scatterometers/ The n&k Gemini and Gemini-M are specifically designed for measurements of Conventional and EUV photomasks. These tools are based on polarized Reflectance (Rs and Rp) and polarized Transmittance (Ts and Tp) measurements, with a 50μm spot size for Rs, Rp, Ts, Tp. Polarized Reflectance and Polarized Transmittance are simultaneously measured to determine film thickness and n and k spectra from 190nm – 1000nm, as well as depth, CD and Profile of trenches and contact holes of Conventional and EUV photomasks. The Gemini Series is our “next-generation” DUV-Vis-NIR Scatterometer/Thin Film series for photomasks. This series was launched in 2011, superseding the previous generation 5700-CDRT and 1700-CDRT. Advancements in the optical design of the Gemini Series provide a 50μm spot size for Ts and Tp in comparison to the 200μm spot size of previous generations.
Thin Film Metrology Systems for Transparent and Opaque Substrates,
Designed for Conventional and EUV Photomasks
Thin Film
or more
layers of phase shift masks including:
OCD Structures Trench Array Capability Chart for the Gemini Series Contact Hole Array Capability Chart for the Gemini Series
Photomasks
determination of CDs in production
Gemini Series Due to their ability to measure a large range of OCD and thin film structures that cover current and future applications, the tools belonging to the Gemini Series are used extensively for the most challenging applications of today’s semiconductor industry.