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Metrology Systems

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Opaque Substrates Only

TF Series:OptiPrime-TF, OptiPrime-TF-M,
LittleFoot-TF

optiprime

n&k OptiPrime-TF
General OverviewGeneral Overview (click here to collapse)

DUV-Vis-NIR (Wavelength Range: 190nm – 1000nm) Thin Film Metrology Systems for Patterned and Unpatterned Wafers:

The n&k OptiPrime-TF, OptiPrime-TF-M and n&k LittleFoot-TF are DUV-Vis-NIR thin film only metrology systems, based on unpolarized Reflectance (R) measurements from 190nm to 1000nm with microspot technology. These tools measure thickness and n and k spectra from 190nm – 1000nm of thin films on patterned and unpatterned wafers.

Analogous to their scatterometer counterparts, the OptiPrime-TF, OptiPrime-TF-M and LittleFoot-TF are our “next-generation” DUV-Vis-NIR thin film series, launched in 2012, superseding the previous generation, 7000, 3000, and 1700 Series, respectively. Advancements in the optical design of the OptiPrime-TF Series provide a smaller micro spot over the previous generation.

The n&k LittleFoot-TF is a fully automated system, with approximately 40% reduction in footprint, resulting in a significant savings in the utilization of fab space. This reduction in footprint is achieved through an innovative and patented wafer handling mechanism. The n&k Little-Foot-TF is as reliable and fast as any robot-based handing system, but at a much reduced cost.

Thin FilmThin Film (click here to collapse)

Below are examples of measurements achieved by the OptiPrime-TF Series and Littlefoot-TF for both patterned and blanket films:

  • Standard films such as SiOx, SiNx, Poly-Si, a-Si:H, SiCx,
    SiGex, a-C:H, TiNx, AlOx
  • Polyresists, polymers, polyimides
  • Thin metal films (less than ~ 800Å in general)
    • – Al
    • – CrSi
    • – Ta
    • – Ti
    • – W
    • – Cu
    • – Fe
    • – Au
    • – Ag
  • High-k films
  • Low-k films
  • Chalcogenide films
  • SOI
  • Graphene
  • Inhomogeneous films
  • A variety of complex film stacks, including
    • – Multi-Layer Film Stacks with Inhomogeneous Under-Layer
    • – Multi-Layer Film Stacks with Unknown Under-Layer
    • – Ultra-Thin Films (down to a few Å), e.g., a Monolayer of Graphene
  • Ultra-Thin Residual Layers
  • Films Deposited on Rough Surfaces
  • Films on Substrates Besides Silicon:
    • – For example: GaAs, SiC, AlTiC
  • Films on rough surfaces
  • Surface and interface roughness of thin films
  • Energy Band Gap
  • Compositon (e.g., %Ge in SiGex; %N, %H, %O in SiOxNx:H,
    %N in TiNx, etc.)
  • Crystallinity (e.g., degree of crystallinity of Poly-Si or GST)
TF SeriesTF Series (click here to collapse)

The TF Series includes a variety of tools, both manual and automatic, for a variety of wafer sizes. The table below presents the differences between the tools:

ModelWafer SizeWafer Handling
OptiPrime-TF300mm, 200mm,
150mm
Fully Automated
OptiPrime-TF-
M
300mm, 200mm,
150mm
Manual Load with Automated X-
Y Stage
LittleFoot-TF200mm, 150mmFully Automated with unique
wafer handling mechanism that
reduces the footprint
Opaque Substrates Only
  • TF Series
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  • OptiPrime-CD Series
  • LittleFoot-CD Series
  • Disk Metrology
About n&k Metrology Systems System Capabilties Publications & Papers

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