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Opaque Substrates Only

Olympian Series: Olympian

n&k 1500-D

n&k Olympian

General OverviewGeneral Overview (click here to collapse)

DUV-Vis-IR (Wavelength Range: 190nm – 15,000nm)
Scatterometers/Thin Film Metrology Systems:

The n&k Olympian Series is a DUV-Vis-IR scatterometer/thin film metrology system with micro-spot technology, covering the wavelength range from 190nm – 15,000nm. With the inclusion of the infra-red wavelength range, the Olympian Series extends the capabilities of n&k’s DUV-Vis-NIR scatterometer series – the OptiPrime-CD Series. The systems in the Olympian-Series are capable of determining thickness, n and k spectra from 190nm – 15,000nm of thin and thick films, as well as depths, CDs, and profiles of trenches and contact holes.

1000nm to 15,000nm Wavelength Range1000nm to 15,000nm Wavelength Range (click here to collapse)

The extended wavelength range of the Olympian, from 1000 nm – 15,000 nm, is needed for applications involving:

  • High aspect ratio structures, such as contact holes in silicon, or line/space trenches with narrow CD
  • Very complex line/space deep trench and contact hole structures, including depths of 60μm or greater
  • Conventional structures, if initial measurements using DUV-Vis-NIR wavelength range does not reveal sufficient information to determine depth, CD and profile
  • Complex ultra-thick film structures (i.e. very thick SOI structures)
  • Epi-Si thickness (silicon is transparent in the IR regime, but opaque in the DUV-Vis-NIR regime)
  • Ultra-Thick Photoresist: Pre and Post Etch

Thin FilmThin Film (click here to collapse)

  • Standard films such as SiOx, SiNx, Poly-Si, a-Si:H, SiCx, SiGex, a-C:H, TiNx, AlOx
  • Polyresists, polymers, polyimides
  • Thin metal films (less than ~ 800Å in general)
    • – Al
    • – CrSi
    • – Ta
    • – Ti
    • – W
    • – Cu
    • – Fe
    • – Au
    • – Ag
  • High-k films
  • Low-k films
  • Chalcogenide films
  • SOI
  • Graphene
  • Inhomogeneous films
  • A variety of complex film stacks, including
    • – Multi-Layer Film Stacks with Inhomogeneous Under-Layer
    • – Multi-Layer Film Stacks with Unknown Under-Layer
  • Ultra-Thin Films (down to a few Å), e.g., a Monolayer of Graphene
  • Ultra-Thin Residual Layers
  • Films Deposited on Rough Surfaces
  • Films on Substrates Besides Silicon:
    • – For example: GaAs, SiC, AlTiC
  • Films on rough surfaces
  • Surface and interface roughness of thin films
  • Energy Band Gap
  • Compositon (e.g., %Ge in SiGex; %N, %H, %O in SiOxNx:H,
    %N in TiNx, etc.)
  • Crystallinity (e.g., degree of crystallinity of Poly-Si or GST)

OCD StructuresOCD Structures (click here to collapse)

  • Small (<100nm) pitch and large (>3μm) pitch trenches and contact holes structures
  • Complex 2-D (trenches) and 3-D (contact holes) structures
    • – Profile
    • – Sidewall Oxide Thickness
    • – Underlayer Thicknesses
  • Etch Monitor for Power Devices at All Process Steps
    • – Si Trench
    • – Poly Recess
    • – Contact Trench
  • FinFET Structures
    • – Gate Height
    • – Gate CD
    • – Fin Height
    • – Fin Top CD
    • – Fin Bottom CD
    • – Oxide Thickness
    • – Dielectric Top Thickness
    • – Dielectric Bottom Thickness
    • – Dielectric Side Wall Thickness
  • Si Trench with Oxide Cutback
  • Detection of trench and contact hole issues:
      • – Collapsed trenches
      • – Under-etch
      • – Over-etch

    In addition, tools within the Olympian Series are capable of measuring films associated with OCD structures, including hard masks on trenches and contact holes and films present at the bottom or lining of these structures.

    trench array chart

    Trench Array Capability Chart for the Olympian Series

    contact hole chart

    Contact Hole Array Capability Chart for the Olympian Series

Olympian SeriesOlympian Series (click here to collapse)

Due to their ability to measure a large range of OCD and thin film structures that cover current and future applications, the tools belonging to the Olympian Series are used extensively for the most challenging applications of today’s semiconductor industry.

Any OCD and Thin Film measurements that are possible with the DUV-Vis-NIR OptiPrime-CD Series can also be achieved with the Olympian-Series (although the reverse is not true).

Opaque Substrates Only
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About n&k Metrology Systems System Capabilties Publications & Papers

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