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About Us

  • Company Profile
  • Our Executive Team
    • Dr. Rahim Forouhi
    • Dr. Iris Bloomer
  • The n&k Premise
  • Company History
  • Testimonials
  • News and Events

Testimonials

Testimonials

“The accuracy, speed & ease-of-use of the n&k analyzer was far superior to standard ellipsometry.”

– Dr. Joseph Kennedy
Product Integration Manager
Honeywell Corporation

“What I really like about the n&k system is its very powerful engine but at the
same time it’s very user friendly. The technical support from n&k is great when
something does go wrong, which is rare, as good as the machine is.”

– Robert Herrick
Process Engineer, R&D Group
Fairchild Semiconductor, Utah

RTC recently bought a 1512-RT n&k tool for phase, transmission, reflectivity,
and resist thickness measurements and it’s a great tool. Greg Hughes, Jeff
Myron, and myself have all worked with it recently and can’t say enough good
things about it

– Dr. Rusty Cantrell,
Member of Technical Staff, Du Pont Photomask (now Toppan)
Round Rock, Texas

“Thank you for your e-mail. I’m also thanking your company and all members
of your company. It’s no problem to write about our experience of your RT
system, because I personally think that your system was greatly helpful in my
research and to our company.”

– Dr. Donggun Lee
Senior Engineer, Photomask Team
Samsung Electronics, Korea

“Quite frankly, I don’t know of any other machine which can provide so much
information, so accurately and so quickly.”

– Dr. Joseph Kennedy
Product Integration Manager
Honeywell Corporation

“Faculty and students at Fudan University are making extensive use of the
n&k 8000 for thin film measurements and also when conducting research,
writing technical papers and theses. Thank you very much for your support.”

– Dr. Sue Jiang
Professor of Materials Science
Fudan University, Shanghai, China

“A CD measurement with the n&k analyzer provides a high throughput,
non-destructive and accurate method for the determination of the critical di-
mensions and depths of periodic structures like trenches and resist gratings.”

– 2012 SEMI Advanced Semiconductor
Manufacturing Conference (ASMC).
Dr. Franz Heider et al, Principal Specialist
Metrology, Infineon Technologies AGTestimonials

About n&k Metrology Systems System Capabilties Publications & Papers

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