Testimonials
“The accuracy, speed & ease-of-use of the n&k analyzer was far superior to standard ellipsometry.”
– Dr. Joseph Kennedy
Product Integration Manager
Honeywell Corporation
“What I really like about the n&k system is its very powerful engine but at the
same time it’s very user friendly. The technical support from n&k is great when
something does go wrong, which is rare, as good as the machine is.”
– Robert Herrick
Process Engineer, R&D Group
Fairchild Semiconductor, Utah
RTC recently bought a 1512-RT n&k tool for phase, transmission, reflectivity,
and resist thickness measurements and it’s a great tool. Greg Hughes, Jeff
Myron, and myself have all worked with it recently and can’t say enough good
things about it
– Dr. Rusty Cantrell,
Member of Technical Staff, Du Pont Photomask (now Toppan)
Round Rock, Texas
“Thank you for your e-mail. I’m also thanking your company and all members
of your company. It’s no problem to write about our experience of your RT
system, because I personally think that your system was greatly helpful in my
research and to our company.”
– Dr. Donggun Lee
Senior Engineer, Photomask Team
Samsung Electronics, Korea
“Quite frankly, I don’t know of any other machine which can provide so much
information, so accurately and so quickly.”
– Dr. Joseph Kennedy
Product Integration Manager
Honeywell Corporation
“Faculty and students at Fudan University are making extensive use of the
n&k 8000 for thin film measurements and also when conducting research,
writing technical papers and theses. Thank you very much for your support.”
– Dr. Sue Jiang
Professor of Materials Science
Fudan University, Shanghai, China
“A CD measurement with the n&k analyzer provides a high throughput,
non-destructive and accurate method for the determination of the critical di-
mensions and depths of periodic structures like trenches and resist gratings.”
– 2012 SEMI Advanced Semiconductor
Manufacturing Conference (ASMC).
Dr. Franz Heider et al, Principal Specialist
Metrology, Infineon Technologies AG