Latest Generation Metrology for Combined Thin Films and OCD Measurements: The n&k EclipSE is our latest generation metrology system that combines spectroscopic reflectometry with single-wavelength ellipsometry. The EclipSE is a fully automated high-throughput system for applications involving ultra-thin films less than a few nm, as well as multi-layer film stacks and very thick films. The EclipSE also provides OCD measurements of complex trench and hole structures, with the accuracy, repeatability, and reproducibility that meets the Ultra-tight specs of advanced FABs.
TSV Development Project: n&k has developed new image based hardware that can be utilized for Depth and CD measurements at any stage of integration of the TSV, whether via first, via middle, or via last. If there is interest in working with n&k to characterize your TSVs please contact us.
n&k’s company profile appearing in the December 2014 issue of Solid State Technology succinctly provides the company’s background, as well as features and capabilities of our key products.
n&k Technology is proud to announce that an entire section in Wikipedia now appears regarding the Forouhi-Bloomer Equations. The title of the piece is “Refractive index and extinction coefficient of thin film materials”. You can find the article in Wikipedia.org under its title or under “Forouhi-Bloomer Equations”. The Forouhi-Bloomer Equations represent a physically valid universal set of equations for n and k as functions of wavelengths that include Extreme Ultra-Violet (EUV) to Infra-Red (IR) wavelengths.
n&k has extended the capabilities of its thin film OCD metrology tools by adding the ability to measure the stress of films deposited films deposited on silicon wafers. This new feature will be available on all new Olympian, OptiPrime, and LittleFoot systems starting in July 2014.
n&k ships fully automated 5000-CD system to Europe
The n&k Optiprime scatterometer ships to a leading power device manufacturer in Germany. The n&k OptiPrime is one of n&k’s bestselling tools for power devices, offering the capability to measure complex film stacks, 2D (trenches) and 3D (contact holes).
Effects of Measured Spectral Range on Accuracy and Repeatability of OCD Analysis, published in Solid State Technology, co-authored by Infineon and n&k.
The n&k Gemini passes intense acceptance testing by a major US semiconductor manufacturer for measurements of EUV photomasks. The n&k Gemini is an ultra-high resolution scatterometer specifically designed for accurate and repeatable OCD measurements of depths, CDs and profiles of complex 2-D and 3-D structures, as well as thicknesses, and n and k spectra of multi-layer films pertaining to photomasks.
Two n&k LittleFoot scatterometers ship to leading power device manufacturers in Japan. The cost effective, fully automated LittleFoot , with a footprint less than 40% (approximately) of conventional scatterometers, has all the capabilities of the n&k OptiPrime, providing measurements of complex film stacks, 2D (trenches) and 3D (contact holes).
n&k Japan celebrates its one year anniversary. Since n&k opened the new branch office to better serve customers in Japan, business has improved dramatically with several orders for n&k’s scatterometers. Customers are pleased with, and appreciate the direct support they are now receiving.
n&k Technology welcomes Auros Technology as its new distributor for n&k’s Scatterometry and Thin Film Metrology tools in Korea. Auros Technology brings a strong background in proving leading edge metrology to high tech customers in Korea, along with a world class service team.
n&k Technology welcomes Challentech as its new distributor for automated Scatterometry and Thin Film Metrology tools in Taiwan and China. Challentech has successfully introduced the capabilities of the n&k’s latest generation Scatterometers/Thin film Metrology Systems, including the Olympian, Optiprime-CD, LittleFoot and Gemini. The unique features of these tools, involving measurements of high aspect ratio 2D (trenches) and 3D (contact holes) structures, complex film stacks that include Epi-Si and thick SOI, and 2D and 3D structures, EUV and conventional photomasks, are ideal for the high volume manufacturing industries in Taiwan and China.
n&k Technology will be attending the following meetings & events:
SPIE Advanced Lithography
San Francisco, CA
July 10 – 12, 2018
Booth # 1404
SPIE Photomask Technology
Monterey Conference Center and Monterey Marriott
September 18 – 19, 2018