Latest Generation Metrology for Combined Thin Films and OCD Measurements: The n&k EclipSE is our latest generation metrology system that combines spectroscopic reflectometry with single-wavelength ellipsometry. The EclipSE is a fully automated high-throughput system for applications involving ultra-thin films less than a few nm, as well as multi-layer film stacks and very thick films. The EclipSE also provides OCD measurements of complex trench and hole structures, with the accuracy, repeatability, and reproducibility that meets the Ultra-tight specs of advanced FABs. Posted on January 15, 2018 by Thomas Luong in News
