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The n&k Olympian Metrology System

The n&k Olympian utilizes n&k’s patented optical design that generates optimized reflectance data (optimized signal-to-noise) covering DUV-Vis-IR wavelengths from 190 nm to 15,000 nm to determine the optical properties (n and k), and thicknesses of ultra-thick and thin films, plus depths, CDs and profiles of complex 2-D and 3-D structures. This fully-automated system has a very low COO and can be configured for various size wafers (12", 8", 6") to expand the semiconductor applications of n&k’s UV-Vis-NIR system (the n&k 5000-CD) to include ultra-thick films such as Epi-Si and very thick photoresists and polymers (>1000nm), as well as complex 2-D and 3-D structures with ultra-high aspect ratios.

On the software end, a valid physical model combines the Forouhi-Bloomer Dispersion Equation for n and k and Rigorous Coupled Wave Analysis (RCWA) to analyze raw reflectance data. The Forouhi-Bloomer (FB) model describes the Refractive Index, n, and the Extinction Coefficient, k as functions of wavelength l, and was derived based on first principles quantum mechanics. The scientific derivations of the FB model were originally published in 1986 and 1988, and a related patent was subsequently granted in 1990.

Olympian System Operation Flow