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Diskcon 2008
Date: September 17 - 18, 2008
Location: Hyatt Regency Hotel/Santa Clara Convention Center, Santa Clara, California
Booth: 205

SPIE Bacus 2008
Date: October 7 - October 8, 2008
Location: Monterey Conference Center, Monterey, California
Booth: 206


SPIE Bacus 2008
Date & Tme: October 9, 2008, 10:20 am
Location: Monterey Conference Center, Monterey, California - Session 25, Ferrante Room
Oral Presentation Title: "Comparative Scatterometric CD and Edge Profile Measurements on a MoSi Mask Using Different Scatterometers"
Authors: Advanced Mask Technology Center (AMTC, Germany)) , Physikalisch-Technische Bundesanstalt (Germany), n&k Technology

 

 




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To contact public relations:

e-mail: inforequest@nandk.com

phone: 408-513-3800

fax: 408-513-3850

standard mail:
n&k Technology, Inc.
80 Las Colinas Lane
San Jose, CA 95119

 

01-25-06 n&k Technology Solves Problem of Optically Measuring Pelliclized Photomasks

07-12-05 Semicon Daily News: Interview with Dr. Rahim Forouhi , President and founder of n&k Technology, Inc
01-01-04 International Fabtech (21 st Edition): Broadband spectrophotometry for phase-shift-mask metrology
03-10-03 Advanced Packaging: Characterization of Ultra-Thick Photoresists
02-15-03 Solid State Technology: Using Broad-Band Reflectrometry for fast trench-depth measurement