n&k Technology- Metrology for Film Thickness, n and k, Trench and Contact Hole Depth CD Profile

Shows and Conferences

SPIE Advanced Lithography
Date: February 23, 2010 to February 24, 2010
San Jose Convention Center
San Jose, California
Booth # 509

Press Releases

01-25-06 n&k Technology Solves Problem of Optically Measuring Pelliclized Photomasks

To contact public relations:

e-mail: inforequest@nandk.com

phone: 408-513-3800

fax: 408-513-3850

standard mail:
n&k Technology, Inc.
80 Las Colinas Lane
San Jose, CA 95119