sicher handeln mit binären optionen melatonin försäljning Company Profile:n&k Technology, Inc., of San Jose, California, was founded in 1992 by Drs. Rahim Forouhi
and Iris Bloomer. The company manufactures exceptionally high resolution, state-of-the-art
scatterometry (OCD) and thin film metrology tools for the semiconductor, photomask, data
storage, flat panel display and solar cell industries. n&k’s large family of tools provide measure-
ments for a large range of OCD and thin film structures that cover current and future applications,
and are used for the most challenging applications of today’s high tech industries.
chat sobre opciones binarias n&k’s thin film measurement systems accurately and repeatably determine thicknesses, order Keflex without prescription to ship overnight n and es posible ganar con opciones binarias k
spectra and energy band gap of ultra-thin (e.g., a mono-layer of graphene) and ultra-thick films
(e.g. Epi-Si layers) comprising single-layer and multi-layer film stacks. Films can be deposited on
either rough or smooth surfaces.
هل تستطيع حقا ربح المال على الإنترنت n&k’s scatterometers accurately and repeatably determine depth, CD, and profiles of complex
2D (trenches) and 3D (contact holes) structures – even structures with high aspect ratios.
Pitches can be very small or large. In addition, n&k scatterometers measure ultra-thin films
incorporated on or in or lining such 2-D and 3-D structures.
trading demokonto test The core technology is based on DUV-Vis-NIR (or IR) broadband reflectance (and transmittance
if substrate is transparent), utilizing patented reflective optics that provides optimized signal-to-
noise of the raw data. Analysis is based on the Forouhi-Bloomer Dispersion Equations for binäre optionen zoomtrader n and
migliore sito operazioni binarie k of thin films, combined with Rigorous Coupled Wave Analysis for OCD structures.
aprenda opções binarias n&k Technology’s scatterometers and thin film metrology tools are field-proven, production-
worthy, fast, and non-destructive, enabling process control and yield improvement of
technological devices comprising thin films, trenches, and contact holes.